The experimental realization is based on a vapor deposition system, where the desired components are first vaporized separately to form atomic species in an ultra-high vacuum (UHV) chamber. These gas species are then deposited simultaneously in a statistical distribution on a substrate. The evaporation sources are resistance-heated effusion cells and an electron-beam gun together with a microwave plasma source for the dissociation/activation of the gases employed. The substrate resides on a sample holder, the temperature of which can be adjusted between 77 and 600 K. The sample holder is part of a moveable transfer system, which is connected to the preparation chamber by a lock chamber. In this way, a transfer of the samples from the preparation chamber to, for example, a diffractometer is possible while preserving both the cooling and the vacuum. In addition to the control of the various sources the atmosphere in the chamber during the deposition is monitored using a mass spectrometer. The system possesses cryo-pumps, which creates a basic pressure of <1×10-8 mbar, and allows pressures during processing in the range of 3-6×10-5mbar. Furthermore, it is possible to fill the evaporation sources with air- and humidity-sensitive substances through a transfer box.
UHV-preparation chamber including lock chamber to the movable transfer system:
1) Sample holder with sapphire substrate, integrated heating, and pipe connection for LN2, 2) electron-beam gun, 3) effusion cell, 4) MW-plasma source, 5) gate valve to the cryo-pumps, 6) transfer-box with gate valve.