Interface effects on the electrical conductivity of oxide thin films
Fig. 1 Conductance vs. thickness diagrams for (a) Ce0.9Gd0.1O1.95 and (b) nominally pure CeO2 thin films. The films grown on SiO2 are nanocrystalline with an average grain size which varies as a function of the thickness of the film [1]. Reproduced with permission of the PCCP Owner Societies.
Fig. 2 Arrhenius plot of the Ce0.9Gd0.1O1.95 thin films with different microstructure: epitaxial, nanocrystalline with average grain size 40 nm (ht) and nanocrystalline with average grain size 10 nm (rt) [2,4]. Reproduced with permission of the PCCP Owner Societies.
Fig. 3 Oxygen partial pressure dependence of nanocrystalline thin films with an average grain size of 40 nm (black symbols) and 10 nm (red symbols), respectively. Remarkably at pO2 = 10-5 bar, 25% of the total conductivity is electronic [2,4]. Reproduced with permission of the PCCP Owner Societies.
![Fig. 1 Conductance vs. thickness diagrams for (a) Ce0.9Gd0.1O1.95 and (b) nominally pure CeO2 thin films. The films grown on SiO2 are nanocrystalline with an average grain size which varies as a function of the thickness of the film [1]. Reproduced with permission of the PCCP Owner Societies. Fig. 1 Conductance vs. thickness diagrams for (a) Ce0.9Gd0.1O1.95 and (b) nominally pure CeO2 thin films. The films grown on SiO2 are nanocrystalline with an average grain size which varies as a function of the thickness of the film [1]. Reproduced with permission of the PCCP Owner Societies.](/6276985/original-1518447125.jpg?t=ZXlKM2FXUjBhQ0k2T0RRNExDSm1hV3hsWDJWNGRHVnVjMmx2YmlJNkltcHdaeUlzSW05aWFsOXBaQ0k2TmpJM05qazROWDA9LS04NzEzMTMyMzlmNWJjOTYxMmU0NWNkZWE0ODhhNmI5ZTlhZDUwMDU0)
![Fig. 2 Arrhenius plot of the Ce0.9Gd0.1O1.95 thin films with different microstructure: epitaxial, nanocrystalline with average grain size 40 nm (ht) and nanocrystalline with average grain size 10 nm (rt) [2,4]. Reproduced with permission of the PCCP Owner Societies. Fig. 2 Arrhenius plot of the Ce0.9Gd0.1O1.95 thin films with different microstructure: epitaxial, nanocrystalline with average grain size 40 nm (ht) and nanocrystalline with average grain size 10 nm (rt) [2,4]. Reproduced with permission of the PCCP Owner Societies.](/6276997/original-1518447126.jpg?t=ZXlKM2FXUjBhQ0k2TXpReExDSm1hV3hsWDJWNGRHVnVjMmx2YmlJNkltcHdaeUlzSW05aWFsOXBaQ0k2TmpJM05qazVOMzA9LS0zNTU4ZWJmNTg5MWJkNTgwYmNhNTc1MzQyZDc3NWIwOGM4MDkzMzEz)
![Fig. 3 Oxygen partial pressure dependence of nanocrystalline thin films with an average grain size of 40 nm (black symbols) and 10 nm (red symbols), respectively. Remarkably at pO2 = 10-5 bar, 25% of the total conductivity is electronic [2,4]. Reproduced with permission of the PCCP Owner Societies. Fig. 3 Oxygen partial pressure dependence of nanocrystalline thin films with an average grain size of 40 nm (black symbols) and 10 nm (red symbols), respectively. Remarkably at pO2 = 10-5 bar, 25% of the total conductivity is electronic [2,4]. Reproduced with permission of the PCCP Owner Societies.](/6277009/original-1518447126.jpg?t=ZXlKM2FXUjBhQ0k2TXpReExDSm1hV3hsWDJWNGRHVnVjMmx2YmlJNkltcHdaeUlzSW05aWFsOXBaQ0k2TmpJM056QXdPWDA9LS0xNWIxOTE1YmE0MjAyNGI4ZGExYTRlN2YwMmQ1ODgzMTM0MjllMzQ3)