Laser-light for Advanced Film Deposition

 

Artistic representation of the growth of a heterostructure consisting of three binary oxide layers by thermal laser epitaxy.

The video was produced by Nymus 3D.

State of the Art, Trends, and Opportunities for Oxide Epitaxy. F.V.E. Hensling, et al. APL Mater. 12, 040902 (2024) - invited perspective -

 

Figure: (left) Grazing incidence XRD pattern and (right) cross-sectional SEM image of one of the first TLE-grown TiO2 film on Si (100). The film consists of a mixture of the rutile and anatase phases. The polycrystalline TiO2 film grew on the unheated substrate in a columnar structure.   
Link to research article "Epitaxial Growth of Oxide Films Using Thermal Laser Epitaxy"
D. Y. Kim, J. Mannhart, and W. Braun
Atomic Force Microscopy (AFM) image of a SrTiO₃ surface prepared by high-temperature annealing. The terraces are covered by a uniform surface reconstruction as an ideal template for subsequent epitaxy.
Link to research article "
High-Temperature Oxide Surface Preparation"
M. Jäger, A. Teker, J. Mannhart, and W. Braun
Concept of thermal laser epitaxy (TLE). Both the substrate and the sources are heated by laser beams from the outside. Samples and sources are exchangeable without breaking vacuum. The evaporation lasers are directed through apertures that protect the entrance window. Pale yellow and green areas indicate the flux distributions of the sources.
Link to research article "Thermal Laser Epitaxy"
W. Braun and J. Mannhart
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